View source for MNC 2008

{{Event
 | Acronym = MNC 2008
 | Title = 21st International Microprocesses and Nanotechnology Conference
 | Type = Conference
 | Series = 
 | Field = Nanotechnology
 | Homepage = imnc.jp
 | Start date = Oct 27, 2008 
 | End date =  Oct 30, 2008
 | City= Fukuoka
 | State = 
 | Country =  Japan
 | Abstract deadline = 
 | Submission deadline = Jun 30, 2008
 | Notification = 
 | Camera ready = 
}}

<pre>
MNC 2008 SCOPE and SYMPOSIUM
1-1:DUV, VUV, EUV Lithography and Metrology
1-2:Electron- and Ion-Beam Lithography
1-3:Resist Materials and Processing
2-1:Nanodevices
2-2:Nanofabrication
2-3:Nanomaterials
2-4:Nano-Tool
3:Nanoimprint, Nanoprint and Rising Lithography
4:Bio MEMS, Lab on a Chip
5:Microsystem Technology and MEMS

Symposium A. Lithography Technology for 32nm node device
Symposium B. Sensor Applications of Micro- process and Nanotechnology
Symposium C. Nanoimprint Technology
		
Conference Site:
JAL Resort Sea Hawk Hotel Fukuoka, Japan

IMPORTANT DATE

Abstract Deadline:
June 30, 2008

Late News Paper :
September 1, 2008

Registration:
October , 2008

JJAP Proceeding
October 30, 2008
	</pre>This CfP was obtained from [http://www.wikicfp.com/cfp/servlet/event.showcfp?eventid=3216&amp;copyownerid=2 WikiCFP]
Acronym	MNC 2008 +
End date	October 30, 2008 +
Event type	Conference +
Has coordinates	33° 37' 30", 130° 37' 5"Latitude: 33.625125 Longitude: 130.61800277778 +
Has location city	Fukuoka +
Has location country	Category:Japan +
Homepage	http://imnc.jp +
IsA	Event +
Start date	October 27, 2008 +
Submission deadline	June 30, 2008 +
Title	21st International Microprocesses and Nanotechnology Conference +