MNC 2008
MNC 2008 | |
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21st International Microprocesses and Nanotechnology Conference
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Dates | Oct 27, 2008 (iCal) - Oct 30, 2008 |
Homepage: | imnc.jp |
Location | |
Location: | Fukuoka, Japan |
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Important dates | |
Submissions: | Jun 30, 2008 |
Table of Contents | |
MNC 2008 SCOPE and SYMPOSIUM 1-1:DUV, VUV, EUV Lithography and Metrology 1-2:Electron- and Ion-Beam Lithography 1-3:Resist Materials and Processing 2-1:Nanodevices 2-2:Nanofabrication 2-3:Nanomaterials 2-4:Nano-Tool 3:Nanoimprint, Nanoprint and Rising Lithography 4:Bio MEMS, Lab on a Chip 5:Microsystem Technology and MEMS Symposium A. Lithography Technology for 32nm node device Symposium B. Sensor Applications of Micro- process and Nanotechnology Symposium C. Nanoimprint Technology Conference Site: JAL Resort Sea Hawk Hotel Fukuoka, Japan IMPORTANT DATE Abstract Deadline: June 30, 2008 Late News Paper : September 1, 2008 Registration: October , 2008 JJAP Proceeding October 30, 2008
This CfP was obtained from WikiCFP
Facts about "MNC 2008"
Acronym | MNC 2008 + |
End date | October 30, 2008 + |
Event type | Conference + |
Has coordinates | 33° 37' 30", 130° 37' 5"Latitude: 33.625125 Longitude: 130.61800277778 + |
Has location city | Fukuoka + |
Has location country | Category:Japan + |
Homepage | http://imnc.jp + |
IsA | Event + |
Start date | October 27, 2008 + |
Submission deadline | June 30, 2008 + |
Title | 21st International Microprocesses and Nanotechnology Conference + |